Electron microscope

Radiant energy – Inspection of solids or liquids by charged particles – Electron microscope type

Reexamination Certificate

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Details

C250S306000, C250S310000, C250S492200, C250S492300

Reexamination Certificate

active

11052809

ABSTRACT:
In order to provide an electron microscope which enables the operator to position the field-of-view easily and accurately on a target fault, the electron microscope for observing a surface or inside of a semiconductor wafer or a mask for exposing a semiconductor pattern for faults and/or foreign objects, is provided comprising a function of loading measurement data of coordinates or sizes of faults or objects which were observed by another wafer or mask inspecting apparatus, moving the field of view of the electron microscope to the area where said fault or object exists, and displaying the coordinates of faults or objects which were obtained by another wafer or mask inspecting apparatus, the field-of-view of the electron microscope and its vicinity, a function of a pointing device switch which moves the field-of-view of the electron microscope to a position which is pointed to by a pointer on said display, and a function of changing the display as said field-of-view moves.

REFERENCES:
patent: 6259660 (2001-07-01), Inokuchi
patent: 6259960 (2001-07-01), Inokuchi
patent: 6334097 (2001-12-01), Yoshitake et al.
patent: 6404911 (2002-06-01), Ishihara et al.
patent: 6476388 (2002-11-01), Nakagaki et al.
patent: 6476913 (2002-11-01), Machida et al.
patent: 6542830 (2003-04-01), Mizuno et al.
patent: 6549222 (2003-04-01), Skoll
patent: A 64-84555 (1989-03-01), None
patent: A 6-310072 (1994-11-01), None

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