Megasonic wafer cleaning tank with reflector for improved...

Details Megasonic wafer cleaning tank with reflector for improved... Megasonic wafer cleaning tank with reflector for improved...

2007-01-23

2007-01-23

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

C134S186000, C134S902000

Reexamination Certificate

active

10736242

ABSTRACT:
In a first aspect, a first apparatus is provided. The first apparatus includes (1) a tank adapted to contain fluid; (2) at least one support component mounted in the tank and adapted to support a substrate in a supported position at least partially submerged in the fluid; (3) a transducer adapted to output sonic energy into the fluid; and (4) a reflector positioned at a side of the substrate and adapted to reflect the sonic energy toward an edge of the substrate so as to provide a 100% duty cycle. The reflector is positioned such that the reflector does not obstruct a path employed to load the substrate into the supported position and to unload the substrate from the supported position. Numerous other aspects are provided.

REFERENCES:
patent: 5090432 (1992-02-01), Bran
patent: 5379785 (1995-01-01), Ohmori et al.
patent: 6026832 (2000-02-01), Sato et al.
patent: 6311702 (2001-11-01), Fishkin
patent: 6460551 (2002-10-01), Fishkin et al.

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