Method for high resolution patterning using soft X-ray,...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

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C430S311000, C430S967000

Reexamination Certificate

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10489411

ABSTRACT:
A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided. The method involves forming an aromatic imine molecular layer having substituents at its terminal rings on a substrate, selectively cleaving bonds to the subsituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer

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Younan Xia et al.,Soft Lithography, 1988, 37, 550-575 Angew. Chem. Int. Ed.

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