Resist for electron beam lithography and a process for...

Details Resist for electron beam lithography and a process for... Resist for electron beam lithography and a process for...

2007-05-22

2007-05-22

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S005000, C430S296000, C430S286100, C430S942000

Reexamination Certificate

active

10376904

ABSTRACT:
The invention relates to a resist for electron beam lithography and to a process for producing photomasks for optical lithography. The inventive resist includes repeating units that are derived from maleic anhydride and that can act as an anchor group for the subsequent binding of silicon-containing groups. The etch stability of the resist can thus be subsequently increased so that there is no dimensional loss on transfer of the resist structure to a chromium layer arranged under the resist.

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