Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-09-18
2007-09-18
Smith, Zandra V. (Department: 2822)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S003000, C438S239000, C438S243000, C438S250000, C438S253000, C438S386000, C438S393000, C438S396000
Reexamination Certificate
active
11055177
ABSTRACT:
A ferroelectric capacitor has the property that polarization of a ferroelectric thin film can readily be reversed and polarization-reversal charge increased. The ferroelectric capacitor has a bottom electrode, a ferroelectric thin film and a top electrode. The top electrode includes a metal crystalline phase and 0.5 to 5 atm % interstitial oxygen atoms in the metal crystalline phase.
REFERENCES:
patent: 5852307 (1998-12-01), Aoyama et al.
patent: 5864153 (1999-01-01), Nagel et al.
patent: 5995359 (1999-11-01), Klee et al.
patent: 6156599 (2000-12-01), Aoyama et al.
patent: 6432835 (2002-08-01), Yunogami et al.
patent: 6454914 (2002-09-01), Nakamura
patent: 2003/0133250 (2003-07-01), Norga et al.
patent: 97-8614 (1997-02-01), None
Duong Khanh
NEC Electronics Corporation
Smith Zandra V.
Young & Thompson
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