Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
Reexamination Certificate
2007-07-10
2007-07-10
Lindsay, Jr., Walter (Department: 2812)
Semiconductor device manufacturing: process
Radiation or energy treatment modifying properties of...
C438S487000, C438S973000, C257SE21328
Reexamination Certificate
active
10237172
ABSTRACT:
Continuous wave laser apparatus with enhanced processing efficiency is provided as well as a method of manufacturing a semiconductor device using the laser apparatus. The laser apparatus has: a laser oscillator; a unit for rotating a process object; a unit for moving the center of the rotation along a straight line; and an optical system for processing laser light that is outputted from the laser oscillator to irradiate with the laser light a certain region within the moving range of the process object. The laser apparatus is characterized in that the certain region is on a line extended from the straight line and that the position at which the certain region overlaps the process object is moved by rotating the process object while moving the center of the rotation along the straight line.
REFERENCES:
patent: 4910549 (1990-03-01), Sugita
patent: 5010230 (1991-04-01), Uemura
patent: 5138131 (1992-08-01), Nishikawa et al.
patent: 5227607 (1993-07-01), Ishiyama
patent: 5372836 (1994-12-01), Imahashi et al.
patent: 5525807 (1996-06-01), Hirokawa et al.
patent: 5571430 (1996-11-01), Kawasaki et al.
patent: 5608223 (1997-03-01), Hirokawa et al.
patent: 5872365 (1999-02-01), Goh et al.
patent: 5903324 (1999-05-01), Lyons et al.
patent: 6096581 (2000-08-01), Zhang et al.
patent: 6160615 (2000-12-01), Matsui et al.
patent: 6204519 (2001-03-01), Yamazaki et al.
patent: 6458635 (2002-10-01), Yamazaki et al.
patent: 6509212 (2003-01-01), Zhang et al.
patent: 6700096 (2004-03-01), Yamazaki et al.
patent: 6723590 (2004-04-01), Zhang et al.
patent: 6844523 (2005-01-01), Yamazaki et al.
patent: 2002/0094008 (2002-07-01), Tanaka
patent: 55-150238 (1980-11-01), None
patent: 61-080814 (1986-04-01), None
patent: 61-179524 (1986-08-01), None
patent: 63-005514 (1988-01-01), None
patent: 64-082636 (1989-03-01), None
patent: 05-275336 (1993-10-01), None
patent: 07-335585 (1995-12-01), None
patent: 2003-332258 (2003-11-01), None
U.S. Appl. No. 10/235,942, filed Sep. 6, 2002, is being related information for the attached application being filed.
Akiba Mai
Miyairi Hidekazu
Shiga Aiko
Shimomura Akihisa
Tanaka Koichiro
Costellia Jeffrey L.
Isaac Stanetta
Lindsay, Jr. Walter
Nixon & Peabody LLP
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