Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-10-31
2006-10-31
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S910000, C430S325000, C430S280100, C430S914000, C430S316000, C430S330000, C430S327000, C430S313000, C430S328000, C430S311000, C430S945000, C430S921000, C430S925000, C526S279000
Reexamination Certificate
active
07129015
ABSTRACT:
A polymer used for a negative type resist composition having a first repeating unit of a Si-containing monomer unit, a second repeating unit having a hydroxy group or an epoxy ring and copolymerized with the first repeating unit is provided. The first repeating unit is represented by the following formula:wherein R1is a hydrogen atom or a methyl group, X is a C1–C4alkyl or alkoxy group, and n is an integer from 2 to 4. Also, there is provided a negative type resist composition including the polymer which is an alkali soluble base polymer, a photoacid generator and a crosslinking agent cross linkable in the presence of an acid.
REFERENCES:
patent: 4551417 (1985-11-01), Suzuki et al.
patent: 5314961 (1994-05-01), Anton et al.
patent: 5674941 (1997-10-01), Cho et al.
patent: 2004/0009436 (2004-01-01), Lee et al.
patent: 2004/0197698 (2004-10-01), Tamaki et al.
patent: 10-142987 (1998-05-01), None
Chem. Abstract—English abstract for JP 10-142987 (Yamaki et al).
Machine-Assisted, partial English translation of JP 10-142987 (Yamaki et al).
Full, formal English translation of JP 10-142987 (Yamaki et al), provided by PTO.
F. Chau & Associates LLC
Lee Sin
Samsung Electronics Co,. Ltd.
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