Fabrication of sub-wavelength structures

Details Fabrication of sub-wavelength structures Fabrication of sub-wavelength structures

2006-10-03

2006-10-03

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S325000, C430S326000

Reexamination Certificate

active

07115355

ABSTRACT:
A method for the manufacture of sub-wavelength structures on substrates is provided, wherein a deformable photoresist is arranged on a substrate. A hydrophilic stamp (made of a material having a higher refractive index than the photoresist) is used to imprint wave guiding structures into the deformable photoresist. Light is coupled into the wave guiding structures to create evanescent waves to expose the photoresist. By imprinting critical dimensions on the substrate and subsequently exposing the resist by means of optical structures integrated in the stamp, those critical dimensions can be further reduced.

REFERENCES:
patent: 6187482 (2001-02-01), Kuroda et al.
patent: 6569575 (2003-05-01), Biebuyck et al.
patent: 6653030 (2003-11-01), Mei et al.
patent: 6671034 (2003-12-01), Hatakeyama et al.
patent: 2005/0130074 (2005-06-01), Krause et al.

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