Method of depositing germanium-containing films

Details Method of depositing germanium-containing films Method of depositing germanium-containing films

2006-11-28

2006-11-28

Smoot, Stephen W. (Department: 2813)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

C427S255280

Reexamination Certificate

active

07141488

ABSTRACT:
Germanium compounds suitable for use as vapor phase deposition precursors for germanium films are provided. Methods of depositing films containing germanium using such compounds are also provided. Such germanium films are particularly useful in the manufacture of electronic devices.

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