Substrate having fine lines, method for manufacturing the...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

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C430S313000, C430S320000

Reexamination Certificate

active

07052825

ABSTRACT:
A substrate includes fine lines. The fine lines are obtained according to a fine-line forming process, which includes a process of projecting light from above the substrate onto predetermined regions on a photosensitive material provided on the substrate and a developing process after the light projection process. A narrow-width portion is provided at an end portion of each of the fine lines in a longitudinal direction of the fine line. The width of the narrow-width portion is smaller than the width of a portion adjacent to the narrow-width portion.

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European Search Report dated Dec. 12, 2005, issued in corresponding European patent appln. No. EP 01 12 9594, forwarded in a Communication dated Dec. 21, 2005.

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