Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2005-08-30
2005-08-30
Coleman, W. David (Department: 2823)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S788000, C438S790000
Reexamination Certificate
active
06936551
ABSTRACT:
One embodiment of the present invention is a method for fabricating a low-k dielectric film that includes steps of: (a) chemical vapor depositing a lower-k dielectric film; and (b) e-beam treating the lower-k dielectric film.
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Demos Alexandros T.
Moghadam Farhad
Roberts Rick J.
Weidman Timothy
Xia Li-Qun
Applied Materials Inc.
Coleman W. David
Moser Patterson & Sheridan
Nguyen Khiem D.
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