Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-12-27
2005-12-27
Tsai, H. Jey (Department: 2812)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S301000, C438S303000
Reexamination Certificate
active
06979622
ABSTRACT:
A transistor is formed using a semiconductor substrate and forming a control electrode overlying the semiconductor substrate. A first current electrode is formed within the semiconductor substrate and adjacent the control electrode. The first current electrode has a first predetermined semiconductor material. A second current electrode is formed within the semiconductor substrate and adjacent the control electrode to form a channel within the semiconductor substrate. The second current electrode has a second predetermined semiconductor material that is different from the first predetermined semiconductor material. The first predetermined semiconductor material is chosen to optimize bandgap energy of the first current electrode, and the second predetermined semiconductor material is chosen to optimize strain of the channel.
REFERENCES:
patent: 6297104 (2001-10-01), Tyagi et al.
patent: 6596594 (2003-07-01), Guo
patent: 6706614 (2004-03-01), An et al.
patent: 2004/0000691 (2004-01-01), Wieczorek et al.
patent: WO 03/012850 (2003-02-01), None
Nguyen Bich-Yen
Thean Voon-Yew
Triyoso Dina H.
Freescale Semiconductor Inc.
King Robert L.
Tsai H. Jey
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