Plasma processing apparatus capable of evaluating process...

Details Plasma processing apparatus capable of evaluating process... Plasma processing apparatus capable of evaluating process...

2005-08-16

2005-08-16

Hassanzadel, P. (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345240, C156S345250, C156S345430, C156S345470, C118S712000, C118S7230ER, C118S7230ER, C118S728000, C315S111010, C315S111310, C315S111610, C315S111210, C204S298390

Reexamination Certificate

active

06929712

ABSTRACT:
A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the chamber. The high-frequency current detector outputs the detected high-frequency current to a computer. The computer compares the high-frequency current received from the high-frequency current detector with a reference high-frequency current. When the received high-frequency current matches the reference high-frequency current, the computer determines that the process performance is normal. Otherwise, the computer determines that the process performance is abnormal. In this way, high-frequency characteristics specific to the apparatus are detected and the process performance are evaluated based on the detected high-frequency characteristics.

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