Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means
Reexamination Certificate
2005-08-16
2005-08-16
Hassanzadel, P. (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With measuring, sensing, detection or process control means
C156S345240, C156S345250, C156S345430, C156S345470, C118S712000, C118S7230ER, C118S7230ER, C118S728000, C315S111010, C315S111310, C315S111610, C315S111210, C204S298390
Reexamination Certificate
active
06929712
ABSTRACT:
A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the chamber. The high-frequency current detector outputs the detected high-frequency current to a computer. The computer compares the high-frequency current received from the high-frequency current detector with a reference high-frequency current. When the received high-frequency current matches the reference high-frequency current, the computer determines that the process performance is normal. Otherwise, the computer determines that the process performance is abnormal. In this way, high-frequency characteristics specific to the apparatus are detected and the process performance are evaluated based on the detected high-frequency characteristics.
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Hanazaki Minoru
Komemura Toshio
Noguchi Toshihiko
Shintani Kenji
Sugahara Keiichi
Kackar Ram N
McDermott Will & Emery LLP
Renesas Technology Corp.
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