Method of using amorphous carbon to prevent resist poisoning

Details Method of using amorphous carbon to prevent resist poisoning Method of using amorphous carbon to prevent resist poisoning

2005-02-15

2005-02-15

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S703000

Reexamination Certificate

active

06855627

ABSTRACT:
An exemplary embodiment relates to a method of using an amorphous carbon layer to prevent photoresist poisoning. The method includes doping a first amorphous carbon layer located above a substrate, providing an oxide layer above the first amorphous carbon layer where the oxide layer has a pinhole, and providing a second amorphous carbon layer adjacent to the oxide layer. The second amorphous carbon layer is undoped and the second amorphous carbon layer helps prevent photoresist poisoning.

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