Dry etching method and apparatus for use in the LCD device

Details Dry etching method and apparatus for use in the LCD device Dry etching method and apparatus for use in the LCD device

2005-01-25

2005-01-25

Norton, Nadine G. (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C216S067000, C216S071000, C216S074000, C438S716000

Reexamination Certificate

active

06846427

ABSTRACT:
A dry etching step during the manufacturing of a substrate for a liquid crystal display (LCD) device is improved by placing the substrate at a predetermined distance away from the lower electrode to prevent damage of the substrate due to electrostatic formed therebetween. An insulating tape attached on the lower electrode provides electrostatic protection between the substrate and the lower electrode, so that the substrate is properly lifted off the lower electrode via the lifting pins of the lower electrode without electrostatic interference.

REFERENCES:
patent: 5665167 (1997-09-01), Deguchi et al.
patent: 5874361 (1999-02-01), Collins et al.
patent: 5904779 (1999-05-01), Dhindsa et al.
patent: 5985104 (1999-11-01), Westwood
patent: 6096572 (2000-08-01), Nakamura
patent: 6177023 (2001-01-01), Shang et al.
patent: 6243251 (2001-06-01), Kanno et al.

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