Multistep cure technique for spin-on-glass films

Details Multistep cure technique for spin-on-glass films Multistep cure technique for spin-on-glass films

2005-04-12

2005-04-12

Niebling, John F. (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S221000, C438S424000, C438S435000, C438S427000, C438S787000, C438S788000

Reexamination Certificate

active

06878644

ABSTRACT:
A method of filling a plurality of trenches etched in a substrate. In one embodiment the method includes depositing a layer of spin-on glass material over the substrate and into the plurality of trenches; curing the layer of spin-on glass material by exposing the spin-on glass material to electron beam radiation at a first temperature for a first period and subsequently exposing the spin-on glass material to an electron beam at a second temperature for a second period, where the second temperature is greater than the first temperature. The method concludes by depositing a layer of silica glass over the cured spin-on glass layer using a chemical vapor deposition technique.

REFERENCES:
patent: 5003178 (1991-03-01), Livesay
patent: 5312512 (1994-05-01), Allman et al.
patent: 5518950 (1996-05-01), Ibok et al.
patent: 5728621 (1998-03-01), Zheng et al.
patent: 5801082 (1998-09-01), Tseng
patent: 5872043 (1999-02-01), Chen
patent: 5994756 (1999-11-01), Umezawa et al.
patent: 6124216 (2000-09-01), Ko et al.
patent: 6132814 (2000-10-01), Livesay et al.
patent: 6171928 (2001-01-01), Lou
patent: 6391781 (2002-05-01), Ozawa et al.
patent: 6399461 (2002-06-01), Liu et al.
patent: 6417073 (2002-07-01), Watanabe
patent: 6448150 (2002-09-01), Tsai et al.
patent: 6479369 (2002-11-01), Miyoshi
patent: 6566229 (2003-05-01), Hong et al.
patent: 6596607 (2003-07-01), Ahn
patent: 6607991 (2003-08-01), Livesay et al.
patent: 20020132486 (2002-09-01), Williams et al.
patent: 20020175146 (2002-11-01), Dokumaci et al.

Affiliated with

Also associated with

Rating

Multistep cure technique for spin-on-glass films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multistep cure technique for spin-on-glass films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multistep cure technique for spin-on-glass films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3379961