Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Flip chip
Reexamination Certificate
2005-04-26
2005-04-26
Potter, Roy (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Flip chip
C257S701000
Reexamination Certificate
active
06885108
ABSTRACT:
A method for forming protective layers on a plurality of semiconductor device components carried by a fabrication substrate includes applying a layer of protective material to surfaces of the semiconductor device components. The layer of protective material is then severed and the fabrication substrate is at least partially severed. Cracks and delaminated regions that are formed during severing are then healed. The protective material may be applied as a preformed sheet or in a liquid form, then at least partially cured or hardened. If a curable polymer is employed as the protective material, it may be partially cured before severing is effected, then self-healed before being fully cured. Alternatively, a thermoplastic material may be used as the protective material, with healing being effected by heating at least regions of the thermoplastic material. Semiconductor device components, including chip-scale packages, which are formed by the method are also disclosed.
REFERENCES:
patent: 5977641 (1999-11-01), Takahashi et al.
patent: 6064114 (2000-05-01), Higgins, III
patent: 6187615 (2001-02-01), Kim et al.
Hinkle S. Derek
Jiang Tongbi
Luo Shijian
Micro)n Technology, Inc.
Potter Roy
TraskBritt PC
LandOfFree
Protective layers formed on semiconductor device components... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Protective layers formed on semiconductor device components..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Protective layers formed on semiconductor device components... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3378347