Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2008-05-13
2008-05-13
Schilling, Richard L. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S273100, C430S327000, C430S396000, C524S543000, C524S544000, C524S545000, C524S546000, C524S547000
Reexamination Certificate
active
07371510
ABSTRACT:
Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no compatibility with a liquid for liquid immersion lithography; and causing no mixing with the resist film, a composite film comprising a protective film formed from the material and a resist film, and a method for forming a resist pattern using them. These can prevent both the resist film and the liquid used from changing in properties during the liquid immersion lithography, so that a resist pattern with high resolution can be formed using the liquid immersion lithography.
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Hirayama Taku
Sato Mitsuru
Takasu Ryoichi
Tamura Koki
Wakiya Kazumasa
Schilling Richard L.
Tokyo Ohka Kogyo Co. Ltd.
Wenderoth Lind & Ponack LLP
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