Thermal processing furnace, gas delivery system therefor,...

Details Thermal processing furnace, gas delivery system therefor,... Thermal processing furnace, gas delivery system therefor,...

2011-03-22

2011-03-22

Price, Carl D (Department: 3749)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

C438S935000, C438S769000, C438S777000, C431S174000

Reexamination Certificate

active

07910494

ABSTRACT:
A gas delivery system for supplying a process gas from a gas supply to a thermal processing furnace, a thermal processing furnace equipped with the gas delivery system, and methods for delivering process gas to a thermal processing furnace. The gas delivery system comprises a plurality of regulators, such as mass flow controllers, in a process gas manifold coupling a gas supply with a thermal processing furnace. The regulators establish a corresponding plurality of flows of a process gas at a plurality of flow rates communicated by the process gas manifold to the thermal processing furnace. The gas delivery system may be a component of the thermal processing furnace that further includes a liner that surrounds a processing space inside the thermal processing furnace.

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