Method of nano-patterning using surface plasmon effect and...

Details Method of nano-patterning using surface plasmon effect and... Method of nano-patterning using surface plasmon effect and...

2011-08-16

2011-08-16

McPherson, John A. (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S323000

Reexamination Certificate

active

07998661

ABSTRACT:
A method of nano-patterning, a method of manufacturing a nano-imprinting master and a discrete track magnetic recording medium are all provided. The method of nano-patterning includes (a) sequentially forming on a substrate an etching object material layer, a photoresist layer, and a metal layer patterned to a first pattern having a structure in which line patterns are repeatedly arranged with a predetermined interval; (b) irradiating light onto a surface of the metal layer to excite surface plasmon so that the photoresist layer is exposed to a second pattern by the surface plasmon; (c) removing the metal layer and developing the photoresist layer; and (d) etching the etching object material layer using the photoresist layer patterned to the second pattern as a mask.

REFERENCES:
patent: 2005/0170657 (2005-08-01), Khang et al.
patent: 2005-303197 (2005-10-01), None
patent: 2005/001569 (2005-01-01), None
patent: 2005/017570 (2005-02-01), None
Computer-generated translation of JP 2005-303197 (Oct. 2005).
McNab, S. J., Blaikie, R.J., Alkaisi, M. M. “Analytic Study of Gratings Patterned by Evanescent Near Field Optical Lithography”, Journal of Vacuum Science and Technology. Nov. 1, 2000, vol. 18, No. 6. New York, NY, US.
Arnold, Matthew D., Blaikie, Richard J. “Using Surface-plasmon Effects to Improve Process Latitute in Near-field Optical Lithography” Proceedings of the 2006 International Conference on Nanoscience and Nonotechnology. Institute of Electical and Electronics Engineers. 2006, pp. 548-551.
Shao, D. B., Chen, S.C. “Surface-plasmon-assisted Nanoscale Photolithography by Polarized Light”. Applied Physics Letters, American Institute of Physics. vol. 86, No. 25, Jun. 16, 2005. Melville, NY, US.

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