Electron beam writing method, fine pattern writing system,...

Details Electron beam writing method, fine pattern writing system,... Electron beam writing method, fine pattern writing system,...

2011-07-05

2011-07-05

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S942000, C360S135000, C369S101000, C369S126000

Reexamination Certificate

active

07972764

ABSTRACT:
When writing elements of a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate, the electron beam is scan controlled so as to completely fill the shape of each of the elements by vibrating the electron beam rapidly in a radius direction of the rotation stage and at the same time deflecting in a direction orthogonal to the radius direction of the rotation stage faster than a rotational speed thereof, thereby sequentially writing the elements.

REFERENCES:
patent: 7026098 (2006-04-01), Komatsu et al.
patent: 2005/0185562 (2005-08-01), Chauhan et al.
patent: 2006-184924 (2006-07-01), None

Affiliated with

Also associated with

Rating

Electron beam writing method, fine pattern writing system,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam writing method, fine pattern writing system,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam writing method, fine pattern writing system,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2654318