Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
1999-12-16
2001-03-13
Baxter, Janet (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S326000, C430S914000, C526S256000, C526S268000, C526S281000, C549S057000, C549S463000, C560S118000, C560S120000
Reexamination Certificate
active
06200731
ABSTRACT:
FIELD OF THE INVENTION
The present invention relates to cross-liking monomers for photoresist polymers, photoresist polymers and photoresist compositions comprising the same. More specifically, it relates to cross-linking monomers which can noticeably improve the polymerization yield of photoresist copolymers, and a process for preparing a photoresist copolymer using the same.
BACKGROUND OF THE INVENTION
Recently, photoresist copolymers wherein alicyclic monomers have been introduced into the main chain or branched chain have proven to be useful to obtain ultra-micro patterns. However, photoresist copolymers consisting of alicyclic monomers typically have a low polymerization yield, thereby synthesis of the copolymer requires high production cost.
In addition, as the amount of the monomer employed in the polymerization increases, the polymerization yield is noticeably lowered, so that the photoresist polymer can be hardly prepared on a large scale.
SUMMARY OF THE INVENTION
The object of the present invention is to solve the problems described above, and to provide cross-linking monomers which can reduce the production cost of photoresist polymers by maximizing their polymerization yield and thereby make mass production of such polymers possible.
Another object of the present invention is to provide photoresist polymers using said cross-linking monomers, and processes for the preparation thereof.
Still another object of the present invention is to provide a photoresist composition using the photoresist polymer described above, which is usable in a lithography process employing an extremely short wavelength light source.
REFERENCES:
patent: 3869502 (1975-03-01), Papa et al.
patent: 3966797 (1976-06-01), Colomb, Jr. et al.
patent: 4352939 (1982-10-01), Paucot
patent: 4707301 (1987-11-01), Lange
Baik Ki Ho
Jung Jae Chang
Jung Min Ho
Koh Cha Won
Lee Geun Su
Baxter Janet
Hyundai Electronics Industries Co,. Ltd.
Lee Sin J.
Townsend and Townsend / and Crew LLP
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