Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1991-03-29
1995-10-10
Neville, Thomas R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430 5, 430321, 430324, 430329, 430945, 369277, 369284, 369285, 378 35, G03C 500
Patent
active
054570069
ABSTRACT:
A photo-mask and a method of manufacturing a photo-mask, which includes the steps of applying a resist film onto a substrate of quartz, glass and the like, subjecting the resist film to light exposure and development to form a fine resist pattern, etching the mask substrate covered by the fine resist pattern, causing a non-light transmitting thin film of Cr, Ta, etc. to adhere thereon by vapor deposition, sputtering and the like, and removing the thin film on the resist pattern together with the resist film, thereby to form the photo-mask.
REFERENCES:
patent: 4094347 (1977-09-01), Smith, Jr.
patent: 4401738 (1983-08-01), Iwamatsu
patent: 4423137 (1983-12-01), Rester
patent: 4655876 (1987-04-01), Kawai et al.
patent: 4686162 (1987-08-01), Shangl et al.
patent: 4797316 (1989-01-01), Hecq et al.
patent: 4925776 (1990-05-01), Ohta et al.
patent: 4980262 (1990-12-01), Thomas et al.
patent: 5079113 (1992-01-01), Ohta et al.
Thompson, Willson and Bowden; "Introduction to Microlithography"; pp. 216-218, ACS Symposium Series, 1983.
Suzuki and Matsui, "High Flatness Mask for Step and Repeat X-Ray Lithography", J. Vac. Sci. Technol. B4(1), Jan./Feb. 1986 pp. 221-225.
Thompson et al., "Introduction to Microlithography", Section 2.3 X-ray Lithography pp. 74-81, ACS 1983.
Hirokane Junji
Inui Tetsuya
Katayama Hiroyuki
Mieda Michinobu
Miyake Tomoyuki
Neville Thomas R.
Sharp Kabushiki Kaisha
LandOfFree
Method of manufacturing photo-mask and photo-mask manufactured t does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of manufacturing photo-mask and photo-mask manufactured t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing photo-mask and photo-mask manufactured t will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2309736