Process for developing a positive electron resist

Details Process for developing a positive electron resist Process for developing a positive electron resist

1980-01-08

1981-11-24

Welsh, John D.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430313, 430325, 430435, 430436, 427431, 427273, 134 38, G03C 524

Patent

active

043025293

ABSTRACT:
A method of developing a positive electron resist for delineating a desired integrated circuit pattern upon a circuit substrate is disclosed for a positive resist consisting of a copolymer film of poly (methyl alpha-chloroacrylate-co-methacrylonitrile) utilizing a developer selected from the group consisting of benzonitrile, a mixture of benzonitrile and methyl cellosolve, and a mixture of benzonitrile and methyl ethyl ketone.

REFERENCES:
patent: 3914462 (1975-10-01), Morisnita et al.
patent: 3935332 (1976-01-01), Poliniak et al.
patent: 4011351 (1977-03-01), Gipstein et al.
patent: 4096290 (1978-06-01), Fredericks
Lai et al., Journal of the Vacuum Society Technology, 16(6), Nov./Dec. 1979.

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