Method of manufacturing main plates for exposure printing

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430 5, 430 23, 430 24, 430320, 430326, G03C 500

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053365879

ABSTRACT:
In order to manufacture a pair of main plates closely contacted with both the faces of a member to be exposed to light, patterns are drawn on a pair of original dry plates by a main pattern drawing device and developed. Thereafter, the developed pattern formed on one of the pair of original dry plates is successively transcribed even times in such a manner that a transcribed pattern having just formed on a newly supplied dry plate at a prior transcription is now transcribed to a fleshly supplied dry plate at a next transcription, and the developed pattern formed on the other one of the pair of original dry plate is successively transcribed odd times in such a manner that a transcribed pattern having just formed on a newly supplied dry plate at a prior transcription is now transcribed to a fleshly supplied dry plate at a next transcription, thereby forming a pair of main plates.

REFERENCES:
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patent: 3973965 (1976-08-01), Suzuki et al.
patent: 4339516 (1982-07-01), van der Waal et al.
patent: 4341591 (1982-07-01), Tamutus
patent: 4738907 (1988-04-01), Shigetomi et al.
patent: 4755257 (1988-07-01), Yamamoto et al.
patent: 4778747 (1988-10-01), Ohta et al.
patent: 4861422 (1989-08-01), Kudou et al.
patent: 5066561 (1991-11-01), Pampalone

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