Source of photochemically generated acids from diazonaphthoquino

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430165, 430189, 430192, 430193, 430270, 430330, 534557, G03F 723, G03F 730

Patent

active

053087445

ABSTRACT:
A new photoacid generator having the formula ##STR1## wherein R=hydrogen, hydroxyl, or the --O--S(.dbd.O).sub.2 --Q moiety;

REFERENCES:
patent: 2772972 (1956-12-01), Herrick, Jr. et al.
patent: 3046121 (1962-07-01), Schmidt
patent: 4421844 (1983-12-01), Buhr et al.
patent: 4457999 (1984-07-01), Stahlhofen
patent: 4467025 (1984-08-01), Goto et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4632900 (1986-12-01), Demmer et al.
patent: 4837121 (1989-06-01), Blakeney et al.
patent: 4963463 (1990-10-01), Koshiba et al.
patent: 5019479 (1991-05-01), Oka et al.
Tarascon et al., Poly(t-BOC-styrene sulfone)-Based Chemically Amplified Resist for Deep-UV Lithography, AT&T Bell Laboratories.
Frechet et al., Polycarbonates Derived From o-Nitrobenzyl Clycidyl Ether: Synthesis and Radiation Sensitivity, Dept. of Chemistry, Univ. of Ottawa, Ontario IBM Research Laboratory, San Jose, California.
Reichmanis et al., The Effect of Substituents on the Photosensitivity of 2-Nitrobenzyl Ester Deep U.V. Resists, J. Electrochem, Jun. 1983 (vol. 130, No. 6).
Reichmanis et al., A Study of the Photochemical Response of o-Nitrobenzyl Cholate Derivatives in P(MMA-MAA) Matrices, Journal of Polymer Science, Polymer Chemistry Edition, vol. 21, (1983).
Reichmanis et al., o-Nitrobenzyl Photochemistry: Solution vs. Solid-State Behavior, Journal of Polymer Science, Polymer Chemistry Edition, vol. 23 (1985)
Reichmanis et al., A novel approach to -nitrobenzyl photochemistry for resists, J. Vac. Sci. Technol., Nov/Dec. 1981.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Source of photochemically generated acids from diazonaphthoquino does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Source of photochemically generated acids from diazonaphthoquino, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Source of photochemically generated acids from diazonaphthoquino will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2114263

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.