Process for producing negative copies in a material based on 1,2

Details Process for producing negative copies in a material based on 1,2 Process for producing negative copies in a material based on 1,2

1984-07-02

1986-04-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430166, 430191, 430192, 430193, 430302, 430328, 430330, G03F 700, G03F 708, G03F 726

Patent

active

045813213

ABSTRACT:
A process for producing negative relief copies is disclosed in which a light-sensitive material, comprising (1) a light-sensitive ester or amide of a 1,2-quinone-diazide-sulfonic acid or of a 1,2-quinone-diazide-carboxylic acid and (2) a hexamethylol melamine ether is imagewise exposed, thereafter heated, and, after cooling, exposed again without an original, and subsequently developed by means of an aqueous-alkaline developer. The disclosed process permits the production of negative copies with the aid of a material which yields positive copies when it is processed in a conventional manner.

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patent: 4387152 (1983-06-01), Stahlhofen
DeForest, W. S., "Photoresist Materials and Processes", McGraw-Hill Book Co., 1975, pp. 47-49 and 55-59.
Pocansky, J., et al., IBM J. Res. Dev., vol. 23, No. 1, 1/1979, pp. 42-51.
Hawley, G., The Condensed Chemical Dictionary, 10th ed., 1981, p. 649.

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