Power semiconductor devices having highly integrated unit cells

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257139, 257401, H01C 2974, H01L 2976

Patent

active

058723773

ABSTRACT:
An insulated gate power semiconductor device includes an array of base contact openings in a continuous source region at a face of a semiconductor substrate, and an array of trenches therein. The trenches are preferably interspersed among the array of base contact openings to maximize the effective channel width of the inversion layer channels which are formed in a base region during forward conduction. The device contains a drift region of first conductivity type therein as well as a base region of second conductivity type which extends between the drift region and the first face. In addition, a continuous source region of first conductivity type is provided which extends from the base region to the first face. The source region also has a two-dimensional array of base contact openings therein through which the base region extends. To improve the forward current carrying capability, first and second pairs of opposing trenches are provided in the substrate, on opposites sides of each of the base contact openings in the array, and an insulated gate electrode is also provided in each of the first and second pairs of opposing trenches. To further improve the current carrying capability of the device, the trenches are preferably formed to have a large effective sidewall area (relative to a given lateral dimension) by increasing the number of sidewalls for each trench to twenty-eight (28).

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