Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-02-08
1996-04-02
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
156345643.1, 1566461, 118719, 213 1, 20429837, C23C 1600, H01L 21306
Patent
active
055036767
ABSTRACT:
A method and apparatus for removing extraneous deposits from particle control surfaces in a microwave plasma generating device. An annular magnetron plasma is formed in contact with a particle control surface having a shape which intersects 200-500 G lines of magnetic induction. The magnetron plasma is scanned across particle control surfaces on a horn and chuck by increasing the current to the main coil and/or mirror coil of the apparatus. As the magnetron plasma moves across the particle control surfaces, the plasma reacts with the extraneous deposits and etches the deposits off of the particle control surfaces.
REFERENCES:
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4434038 (1984-02-01), Morrison, Jr.
patent: 4576698 (1986-03-01), Gallagher et al.
patent: 4588490 (1986-05-01), Cuomo et al.
patent: 4657616 (1987-04-01), Benzing et al.
patent: 4786352 (1988-11-01), Benzing
patent: 4948458 (1990-08-01), Ogle
patent: 5158644 (1992-10-01), Cheung et al.
patent: 5198725 (1993-03-01), Chen et al.
patent: 5200232 (1993-04-01), Tappan et al.
patent: 5211825 (1993-05-01), Saito et al.
Denison Dean R.
Hartsough Larry D.
Shufflebotham Paul K.
Breneman R. Bruce
Chang Joni Y.
Lam Research Corporation
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