Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1990-12-21
1995-11-07
Powell, William A.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
1566261, 1566441, 1566621, 156345, 356381, 356357, H01L 21306, B44C 122
Patent
active
054651549
ABSTRACT:
A reflective method for monitoring the etch rate or growth rate of a material, such as a semiconductor material, that may be initially at least partly covered by another layer of a different material. An aperture in the overlying material is formed to expose a portion of the surface of the layer to be etched or grown, and a monochromatic light beam is directed at the exposed surface to form a signal which can be used to monitor the processing of the material.
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M. Born & E. Wolf, Principles of Optics, Pergamon Press, Fifth Edition, 1975, Chap. 1.
Morris Birgit E.
Powell William A.
Schneck Thomas
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