Inductively coupled RF plasma reactor with floating coil antenna

Details Inductively coupled RF plasma reactor with floating coil antenna Inductively coupled RF plasma reactor with floating coil antenna

1995-06-07

1997-11-04

Niebling, John

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 68, 118723IR, C23F 102

Patent

active

056835396

ABSTRACT:
In an inductively coupled RF plasma reactor having an inductive coil antenna connected through an RF impedance match network to an RF power source, capacitive coupling from the antenna to the plasma is reduced by isolating the coil antenna from the RF power source by an isolation transformer, so that the potential of the coil antenna is floating. The output of the RF impedance match network is connected across the primary winding of the isolation transformer while the floating coil antenna is connected across the secondary winding of the isolation transformer.

REFERENCES:
patent: 4320716 (1982-03-01), Boulanger et al.
patent: 5458732 (1995-10-01), Butler et al.
patent: 5525159 (1996-06-01), Hama et al.
patent: 5540800 (1996-07-01), Qian

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