Developing process

Details Developing process Developing process

1996-05-20

1997-12-23

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430309, G03F 730

Patent

active

057006296

ABSTRACT:
A resist pattern good in resolution and image precision can be obtained by a developing process characterized by jetting a gas on a developing surface during development or after development.

REFERENCES:
patent: 4197126 (1980-04-01), Wessells et al.

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