Method of manufacturing metallic source line, self-aligned conta

Details Method of manufacturing metallic source line, self-aligned conta Method of manufacturing metallic source line, self-aligned conta

1995-08-03

1997-05-20

Chaudhari, Chandra

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

438586, 438790, H01L 218247

Patent

active

056311796

ABSTRACT:
Manufacture of an integrated circuit flash memory devices includes covering a semiconductor substrate with a tunnel oxide layer, a floating gate layer, an intergate dielectric layer, a control gate layer, a silicon dioxide dielectric layer over a silicon nitride layer. Then those layers over the tunnel oxide are patterned into flash memory gate electrode by etching through a source/drain mask followed by ion implanting source/drain dopant ions through the openings formed by etching. Sidewall spacers are formed followed by a dielectric layer through which source line openings are etched down to the source/drain regions. Plug openings are made down to the source/drain regions. An intermetal dielectric layer is deposited comprising PEOX/SOG/PEOX over the device. Then via openings are made over the drain plugs by etching the intermetal dielectric layer through a via mask. Next metal is deposited over the intermetal dielectric layer into the via openings extending down into contact with the drain plugs.

REFERENCES:
patent: 5204286 (1993-04-01), Doan
patent: 5231051 (1993-07-01), Baldi et al.
patent: 5366913 (1994-11-01), Nakao
patent: 5397723 (1995-03-01), Shirota et al.
patent: 5432110 (1995-07-01), Inoue

Affiliated with

Also associated with

Rating

Method of manufacturing metallic source line, self-aligned conta does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing metallic source line, self-aligned conta, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing metallic source line, self-aligned conta will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1723485