Positive resist for electron beam and x-ray lithography and meth

Details Positive resist for electron beam and x-ray lithography and meth Positive resist for electron beam and x-ray lithography and meth

1979-09-18

1981-04-14

Hess, Bruce H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

427 35, 427 36, 427 431, 427273, 428199, 430326, 430921, 430922, 430967, 528382, B05D 306

Patent

active

042620830

ABSTRACT:
Copolymers of an aziridine and sulfur dioxide are disclosed which are useful as positive radiation resists for use in electron beam and x-ray lithography.

REFERENCES:
patent: 3884696 (1975-05-01), Bowden et al.
patent: 3893127 (1975-07-01), Kaplan et al.
patent: 3898350 (1975-08-01), Gipstein et al.
patent: 3935331 (1976-01-01), Poliniak et al.
patent: 3935332 (1976-01-01), Poliniak et al.
patent: 4061829 (1977-12-01), Taylor

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