Positive electron beam resists

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

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430942, 430270, 430285, 430906, 430907, 430908, 430910, G03C 500

Patent

active

042620821

ABSTRACT:
A positive electron beam resist lacquer binder which comprises polymerized or copolymerized units of: (A) 0 to 95 mol-% of at least one alkyl ester of methacrylic acid having from 1 to 20 carbon atoms in the alkyl moiety; (B) 5 to 100 mol-% of at least one monomer corresponding to Formula (I) ##STR1## wherein n is zero or one and one of the groups, X and Y is always a hydrogen atom and X or Y denotes a phenyl or naphthyl group substituted by at least one halogen atom, or a phenyl or naphthyl group substituted by at least one alkyl group having from 1 to 8 carbon atoms, alkoxy group having from 1 to 8 carbon atoms, carboxyl group, cyano group, carboxyalkyl group having from 1 to 4 carbon atoms in the alkyl moiety, or alkylcarbonyl group having from 1 to 8 carbon atoms in the alkyl moiety, provided that when n is one, at least one of X or Y is a hydrogen atom and the other of X or Y; if not a hydrogen atom, is as hereinbefore defined or a halogenoalkylcarbonyl group having from 1 to 4 carbon atoms in the alkyl moiety or a halogen acrylcarbonyl group; (C) 0 to 30 mol-% of an .alpha.,.beta.-monoolefinically unsaturated carboxylic acid having from 3 to 5 carbon atoms; (D) 0 to 40 mol-% of acrylamide, methacrylamide or an N-mono- or N-di-alkyl ester thereof having from 1 to 8 carbon atoms in the or each alkyl moiety; and (E) 0 to 70 mol-% of styrene, .alpha.-methylstyrene, acrylonitrile, methacrylonitrile, vinyl acetate, vinyl propionate vinyl chloride, vinylidene chloride, a vinyl alkyl ether having from 1 to 8 carbon atoms in the alkyl moiety, an allyl acetate, maleic imide, maleic acid, or mixtures thereof; the sum of all of the molar percentages of components A, B, C, D, and E being 100.

REFERENCES:
patent: 3162613 (1964-12-01), Tousignant
patent: 3210326 (1965-10-01), Tousignant et al.
patent: 3833384 (1974-09-01), Noonan et al.
patent: 4011351 (1977-03-01), Gipstein et al.
patent: 4052527 (1977-10-01), Pastor et al.
patent: 4129708 (1978-12-01), Mino et al.

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