Process for forming a pattern on a semiconductor substrate using

Details Process for forming a pattern on a semiconductor substrate using Process for forming a pattern on a semiconductor substrate using

1996-07-29

1997-10-14

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

4302701, 4302801, 430330, G03C 500

Patent

active

056771126

ABSTRACT:
A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these compounds is effective for preventing reflection of deep ultraviolet light from a substrate during formation of resist pattern, resulting in forming ultra-fine patterns without causing notching and halation.

REFERENCES:
patent: 4007271 (1977-02-01), Robertson
patent: 4413052 (1983-11-01), Green et al.
patent: 4843097 (1989-06-01), Shroot et al.
J. Chem. Soc. (C), The Formation of Chromonone-type Systems via the Acylation of Derivatives of 2,6-Dihydroxyanthracene, by D.W. Cameron et al., Univ. Chemical Laboratory, Cambridge, 1967.

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