Positive photoresist containing a mixture of propylene glycol al

Details Positive photoresist containing a mixture of propylene glycol al Positive photoresist containing a mixture of propylene glycol al

1990-06-06

1991-08-13

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430149, 430169, 430330, 430331, G03F 732, G03F 730

Patent

active

050395947

ABSTRACT:
The invention provides a positive working photosensitive element with improved odor and increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a solvent mixture comprising propylene glycol alkyl ether and propylene glycol alkyl ether acetate, onto a substrate, drying, exposing to imaging energy and developing.

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