Plasma forming electrode and method of using the same

Details Plasma forming electrode and method of using the same Plasma forming electrode and method of using the same

1990-02-09

1991-08-13

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

156345, 156643, 118723, 20429831, B01J 1912, H01H 146, C23F 404

Patent

active

050393880

ABSTRACT:
A plasma forming electrode used in pairs disposed in mutually facing spaced parallel relation in a reduced pressure treating chamber, and between which a radio frequency current power is applied to produce a plasma, is formed from preferably highly pure aluminum or an aluminum alloy, and has a chromic acid anodic surface film layer thereon. It has greatly improved durability when used for plasma treatment in the presence of fluorine containing gas.

REFERENCES:
patent: 4419201 (1983-12-01), Levinstein et al.
patent: 4491496 (1985-01-01), Laporte et al.
patent: 4507179 (1985-03-01), Yoshida et al.
patent: 4540449 (1985-09-01), Yoshida et al.
patent: 4939044 (1990-07-01), Ohashi et al.

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