Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-12-22
2000-07-04
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430910, 525132, 525225, G03F 7004
Patent
active
060836598
ABSTRACT:
A polymer mixture for a photoresist composition, and a photoresist composition containing the polymer mixture. The polymer mixture includes a polymer that has two or more different monomers and an acid-labile di-alkylmalonate group bound to the backbone of the polymer; a polymer that has a monomer of (meth)acrylate derivative and one or more other monomers; or a polymer that has a monomer of alkoxystyrene and one or more other monomers. The polymer mixtures are suitable for forming photoresist compositions that generate a pattern having an excellent profile, due to the high contrast and high thermal decomposition temperature of the photoresist composition. The photoresist composition of the present invention further include a photosensitive acid generator.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5368976 (1994-11-01), Tajima et al.
patent: 5733704 (1998-03-01), Choi et al.
patent: 5847063 (1998-12-01), Choi et al.
Chu John S.
Samsung Electronics Co,. Ltd.
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