X-ray mask with Ni pattern

Details X-ray mask with Ni pattern X-ray mask with Ni pattern

1983-09-06

1986-07-08

Schilling, Richard L.

X-ray or gamma ray systems or devices

Specific application

Lithography

430 5, G03F 100, G21K 500

Patent

active

045997373

ABSTRACT:
An X-ray mask having a mask pattern formed from nickel or a material having nickel as a principal component supported on a thin membrane. The X-ray mask has characteristics substantially equal to those of the conventional X-ray mask employing Au as a mask pattern and is much lower in price than the Au-containing mask pattern. In addition, since the X-ray mask can easily be formed by electroless plating, it is possible to form a mask pattern with a higher accuracy than that in case of employing Au alone.

REFERENCES:
patent: 3443915 (1969-05-01), Wood et al.
patent: 3642476 (1972-02-01), Mesley

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