Semiconductor wafer support with graded thermal mass

Details Semiconductor wafer support with graded thermal mass Semiconductor wafer support with graded thermal mass

1996-07-24

1998-12-15

Walberg, Teresa J.

Heating

Accessory means for holding, shielding or supporting work...

Support structure for heat treating ceramics

432241, 432253, 432259, 392418, F27D 500

Patent

active

058488898

ABSTRACT:
An annular-shaped edge ring support for a semiconductor wafer has an innermost radial portion for supporting the semiconductor wafer and an outermost radial portion contiguous with the inner portion. The inner portion has a graded thermal mass that generally increases with increasing radius.

REFERENCES:
patent: 4770630 (1988-09-01), Akimoto et al.
patent: 5316472 (1994-05-01), Niino et al.
patent: 5431561 (1995-07-01), Yamabe et al.
patent: 5443382 (1995-08-01), Tsurumi et al.
patent: 5482559 (1996-01-01), Imai et al.
patent: 5556275 (1996-09-01), Sakata et al.

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