Method of processing substrate and apparatus for processing subs

Details Method of processing substrate and apparatus for processing subs Method of processing substrate and apparatus for processing subs

1996-04-18

1998-12-29

Baxter, Janet C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 396611, 134 10, G03C 500, G03D 500

Patent

active

058539611

ABSTRACT:
A method of processing a substrate having the steps of placing a substrate for forming an LCD on a support, mounting a cover on the substrate in such a manner that a clearance is formed from at least either surface of the substrate placed on the support, introducing developer or pure water into the clearance, bringing the developer or pure water into contact with at least either surface of the substrate, processing the substrate with the developer or pure water, removing the cover from the substrate, and discharging the substrate from the support.

REFERENCES:
patent: 3601029 (1971-08-01), Needleman
patent: 3721175 (1973-03-01), Needleman
patent: 4693211 (1987-09-01), Ogami et al.
patent: 4696885 (1987-09-01), Vijan
patent: 4755844 (1988-07-01), Tsuchiya et al.
patent: 5405508 (1995-04-01), Kawakami et al.
patent: 5562772 (1996-10-01), Neoh
patent: 5678116 (1997-10-01), Sugimoto et al.
patent: 5689749 (1997-11-01), Tanaka et al.

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