Positive working photosensitive composition

Details Positive working photosensitive composition Positive working photosensitive composition

1997-04-25

1999-04-06

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 430920, 430924, 522 31, G03F 7004

Patent

active

058916032

ABSTRACT:
Provided is a positive working photosensitive composition comprising (a) a compound represented by the following formula (I) which generates a sulfonic acid by irradiation with active rays or radiation, and (b) a resin comprising constitutional repeating units of the following formulae (II) and (III) and having groups which enable an increase of the solubility in an alkali developer through their decomposition due to the action of an acid: ##STR1## wherein Y represents an alkyl group, an aralkyl group, or a specific phenyl, naphthyl or anthracenyl group and Y may be bonded to the other imidesulfonate compound residue; and X represents an alkylene group, an alkenylene group, an arylene group, or an aralkylene group, and X may be bonded to the other imidesulfonate compound residue: ##STR2## wherein R.sub.22 represents a hydrogen atom, an alkyl group, or an aralkyl group; and A represents an alkyl group or an aralkyl group, and A may combine with R.sub.22 to complete a 5- or 6-membered ring.

REFERENCES:
patent: 5272042 (1993-12-01), Allen et al.
patent: 5585218 (1996-12-01), Nakano et al.
patent: 5707776 (1998-01-01), Kawabe et al.

Affiliated with

Also associated with

Rating

Positive working photosensitive composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive working photosensitive composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive working photosensitive composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1369730