Method and apparatus for tuning a process recipe to target dopan

Details Method and apparatus for tuning a process recipe to target dopan Method and apparatus for tuning a process recipe to target dopan

Filed on

1996-09-06

Date issued

1999-01-19

Examiner

Teska, Kevin J.

Patent Class

Boots, shoes, and leggings

Other Related Categories

364489, 364490, 438646, G06F 1700

Type

Patent

Status

active

Patent number

058620575

Description

ABSTRACT:
A method and apparatus for tuning a process recipe to target specific dopant concentrations in a doped layer. The present invention controls the process tuning based on predetermined and easily updatable trend curves for that process. The present invention simplifies the tuning process, shortens the time required to tune the process recipe, and is independent of any personal experience, thereby reducing reliance on the variable skills and experience level of any individual equipment support engineer. The present invention uses a computer program based on process characterization to replace the traditional manual tuning approach. Further, the present invention iteratively corrects for process drift and makes possible efficient tuning of dopant concentration levels in the deposited doped film. Other embodiments of the present method and apparatus provide for storage of the tuning history so as to allow incorporation of the history in order to account for the dopant flow drift. Accordingly, the process characterization may be eliminated for a different individual deposition system. The present invention minimizes the number of trials needed before attaining a doped film with the desired dopant concentrations. Additionally, training of equipment support engineers to perform process tuning is made simpler.

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