Method of patterning organic macromolecular film

Details Method of patterning organic macromolecular film Method of patterning organic macromolecular film

1992-04-06

1994-02-15

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430327, 430324, 430315, 1566611, G03C 500

Patent

active

052866106

ABSTRACT:
A CEL material (11) is formed such that a first region (11a) thereof which is formed on a concave portion of a semiconductor substrate (1) is sufficiently thicker than a second region (11b) thereof which is formed on the other region. Light (4) is directed from above to the CEL material (11) for a predetermined period of time to render only the thin second region pervious to light to thereby expose part of a photoresist (2) which is under the second region (11b) by the illumination. Subsequently, the semiconductor substrate (1) is immersed in an appropriate solvent to remove only part of the photoresist (2) which is under the first region (11a). The part of the photoresist (2) which is under the second region 11b remains unremoved.
The photoresist (2) can be patterned with the shape of the concave portion of the semiconductor substrate (1) accurately reflected therein.

REFERENCES:
patent: 4889795 (1989-12-01), Kaifu et al.
patent: 5155060 (1992-10-01), Ikeno et al.

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