Method for producing semiconductor device

Details Method for producing semiconductor device Method for producing semiconductor device

1997-08-04

2000-09-19

Nelms, David

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

438162, 438166, H01L 2100

Patent

active

061210765

ABSTRACT:
A silicon film provided on a blocking film 102 on a substrate 101 is made amorphous by doping Si+, and in a heat-annealing process, crystallization is started in parallel to a substrate from an area 100 where nickel serving as a crystallization-promoting catalyst is introduced.

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