Process for the production of negative relief copies utilizing r

Details Process for the production of negative relief copies utilizing r Process for the production of negative relief copies utilizing r

1989-10-18

1991-02-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430191, 430270, 430328, 430330, G03F 740, G03F 7022

Patent

active

049904299

ABSTRACT:
The invention describes a photosensitive composition, a copying material prepared from this composition, and a process for the production of negative relief copies, in which a photosensitive composition or a photosensitive material, respectively, is used, that comprises a support and a photosensitive composition coated onto the support and comprising a photosensitive 1,2-quinonediazide or a photosensitive mixture, a binder that is soluble in aqueous-alkaline solutions and an s-triazine of the general formula I ##STR1## wherein R denotes akyl, allyl, alkoxy, alkoxycarbonyl, alkoxycarbonylakkenyl, each having from 1 to 4 carbon atoms in the alkyl or alkenyl group, aryloxy, halogen or a nitro group and

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DeForest, W. S., Photoresist Materials and Processes, McGraw-Hill Book Co., 1975, pp. 47-49.
Dudley et al., "Cyanuric Chloride Derivatives, III. Alkoxy-s-Triazines", The J. of Am. Chem. Soc., vol. LXXIII, 7 to 9, 1951, pp. 2986-2992.
F. C. Schaefer et al, "Cyanuric Chloride Derivatives IV. Aryloxy-s-Triazines", Stamford Research Laboratories of the American Cyanamid Company, vol. 73, pp. 2990-2992.

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