Zone-optimized mirrors and optical systems using same

Details Zone-optimized mirrors and optical systems using same Zone-optimized mirrors and optical systems using same

2009-05-05

2011-11-01

Kiknadze, Irakli (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C359S359000, C250S492200

Reexamination Certificate

active

08050380

ABSTRACT:
A zone-optimized mirror (MZ) for reflecting extreme ultraviolet (EUV) or X-ray radiation (18) includes a reflective surface (S) having two or more substantially discrete zones (Z1, Z2, . . . Zn) that include respective coatings (C1, C2, . . . Cn). Each coating is configured to optimally reflect a select range of incident angles of the radiation incident thereon. An EUV optical system (10) and an EUV lithography system (200) that includes at least one zone-optimized mirror are also disclosed.

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