X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1985-02-07
1987-01-06
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 35, 378 83, 250281, 250282, 250399, 2504922, 2505051, G21K 500
Patent
active
046352821
ABSTRACT:
A gas injection type plasma X-ray source has a gas plenum for storing a discharging gas at a pressure in the range of 150 Torr and 1000 Torr, the stored gas being injected between a pair of electrodes through a gas valve. The electrodes are opposed to each other in a vacuum vessel, so that a gas jet for the production of a plasma is formed. A voltage is applied between the electrodes, so that a discharge plasma is produced between said electrodes. A linear plasma with a high temperature and a high density is produced by the pinch of the plasma due to its own magnetic field produced by the current flowing through the plasma, so that X-rays are emitted from the linear plasma. The X-ray source has a high conversion efficiency and a high discharge timing margin, and accordingly the stability and reproducibility of discharges are improved and the X-ray output is increased.
REFERENCES:
patent: 3471694 (1969-10-01), Poen
patent: 3614424 (1971-10-01), Openshaw
patent: 4514858 (1985-04-01), Novak
A. Fisher et al, "Fast Valve for Gas Injection into Vacuum," Review of Scientific Instruments, vol. 49, No. 6, (Jun. 1978), pp. 872-873, American Institute of Physics, New York, U.S.
R. A. Gutcheck et al, "Intense Plasma Source for X-ray Microscopy," Society of Photo-Optical Instrumentation Engineers (SPIE), vol. 316, (1981), pp. 196-202.
W. Clark et al, "The Dynamics of Imploding Argon Plasmas," Journal of Applied Physics, vol. 53, No. 8, (Aug. 1982), pp. 5552-5556, American Institute of Physics.
J. Bailey et al., "Evaluation of the Gas Puff Z Pinch as an X-ray Lithography and Microscopy Source", Appl. Phys. Lett., (40 (1)), 1 Jan. 1982, pp. 33-35.
C. Stallings et al., "Imploding Argon Plasma Experiments", Appl. Phys. Lett., 35(7), 1979, pp. 524-526.
J. S. Pearlman et al., "X-ray Lithography Using a Pulsed Plasma Source", J. Vac. Sci. Technol., 19(4), Nov./Dec. 1981, pp. 1190-1193.
Nakayama Satoshi
Okada Ikuo
Saitoh Yasunao
Yoshihara Hideo
Church Craig E.
Freeman John C.
Nippon Telegraph & Telephone Public Corp.
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